Characterisitics of RF/DC Sputter Grown-ITO/Ag/ITO Thin Films for Transparent Conducting Electrode

Youngjae Lee; Jeha Kim

doi:10.21218/CPR.2022.10.1.028

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2022 Vol.10, Issue 1 Preview Page

Characterisitics of RF/DC Sputter Grown-ITO/Ag/ITO Thin Films for Transparent Conducting Electrode RF/DC 스퍼터 성장한 ITO/Ag/ITO 투명전극 박막의 특성 연구

31 March 2022. pp. 28-32

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Abstract

We investigated the optical and electrical characteristics of ITO/Ag/ITO (IAI) 3-layer thin films prepared by using RF/DC sputtering. To measure the thickness of all thin film samples, we used scanning electron microscopy. As a function of Ag thickness we characterized the optical transmittance and sheet resistance of the IAI samples by using UV-Visible spectroscopy and Hall measurement system, respectively. While the thickness of both ITO thin films in the 3-layered IAI samples were fixed at 50 nm, we varied Ag layer thickness in the range of 0 nm to 11 nm. The optical transmittance and sheet resistance of the 3-layered IAI thin films were found to vary strongly with the thickness of Ag film in the ITO (50 nm)/Ag(t₀)/ITO (50 nm) thin film. For the best transparent conducting oxide (TCO) electrode, we obtained a 3-layered ITO (50 nm)/Ag (t₀ = 8.5 nm)/ITO (50 nm) that showed an avrage optical transmittance, AVT = 90.12% in the visible light region of 380 nm to 780 nm and the sheet resistance, R_□＝7.24 Ω/□.

Keywords

Transparent conducting oxide electrode

sputtering

ITO/Ag/ITO

Thin films

optical transmittance

sheet resistance

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Information

Publisher :Korea Photovoltaic Society
Publisher(Ko) :한국태양광발전학회
Journal Title :Current Photovoltaic Research
Volume : 10
No :1
Pages :28-32
Received Date : 2022-02-11
Revised Date : 2022-03-07
Accepted Date : 2022-03-08
DOI :https://doi.org/10.21218/CPR.2022.10.1.028

Current Photovoltaic Research ISSN:2288-3274(Print) 2508-125X(Online)

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